BFU Bottom-Access FFU | Extra-Large HEPA Airflow System for ISO 4-8
Cleanrooms | Tool-Free Filter Change & Ultra-Low Vibration
The BFU Bottom-Access FFU 1220X620X450 redefines cleanroom air
filtration with its industry-first 450mm ultra-deep chassis,
engineered for critical environments requiring maximum particle
control like semiconductor fabs, biotech GMP facilities, and
aerospace cleanrooms.
Parameter Name | Value |
Material | Box: Galvanized aluminum plate; Diffuser: Baked-paint cold plate |
Fan System | MRJH motor + iron impeller |
Filtration | Aluminum frame HEPA filter (1170×570×69), Efficiency: 99.99% @0.3μm
(H13) |
Air Speed | 0.45–0.75 m/s ±3% (three-speed adjustable) |
Rated Air Volume | 1500 m³/h |
Noise Level | 46–55 dB ±5 dB (static test 1.5m below filter) |
Power Supply | 220V/50Hz, Rated Power: 170W–200W ±5W |
Flange Connection | Optional D=350mm |
Opening Size | Color steel plate: 1225×625 mm |
size | 1220X620X450(mm) |
Certifications | ISO 14644-1,ISO 9001,CE |
| Parameter/Feature | Our Product | Market Average | Advantages |
|---|
| H13 Filter Pleat Count | 315 pleats | 260 pleats | Larger filtration area, improving filtration efficiency and dust
holding capacity. |
| HEPA Filter | - | - | Increased thickness of filtration media enhances filtration
effectiveness and lifespan. |
| Pleat Height | 50 mm | 38 mm | Thicker filtration media improves filtration performance and
longevity. |
| Protective Mesh Brand | High-quality 9N brand | Generic brands | Superior support and protection, ensuring structural stability. |
| Frame Thickness | 1.0 mm | 0.7 mm | Stronger frame for enhanced durability and reduced deformation
risks. |
| Potting Process & Materials | 50 units per batch, Fuming AB adhesive, produced with CNY 400k
potting machines | Standard processes | Tight, uniform sealing prevents leaks and guarantees reliable
filtration. |
| Average Airflow Velocity | 0.8 m/s | 0.65 m/s | Higher airflow capacity with lower resistance, boosting system
efficiency. |
| Motor | Waterproof | Non-waterproof | Enhanced safety and reliability in diverse environments. |
Key Features
1. Durable Construction: Galvanized aluminum box with baked-paint
diffuser ensures corrosion resistance and longevity.
2. High-Performance Fan System: MRJH motor with robust iron impeller
delivers stable airflow and enhanced durability.
3. Precision Airflow Control: Three-speed adjustable wind speed
(0.45–0.75 m/s ±3%) for flexible cleanroom requirements.
4. H13 Filtration: Non-partition HEPA filter achieves 99.99%
efficiency at 0.3μm particles.
5. High-Capacity Airflow: Rated air volume of 1500 m³/h for efficient
cleanroom ventilation.
6. Bottom-Detachable Design: Simplifies maintenance and filter
replacement.
7. Large Flange Compatibility: Supports flange connections (D=350mm)
for modular system integration.
8. Low Noise: Engineered for 46–55 dB (±5 dB) operation at 1.5m below
the filter.
Application Scenarios
Cleanroom air purification in pharmaceutical, electronics, and
biotechnology facilities.
Manufacturing zones requiring ISO-certified H13 filtration with
precise airflow control.
Facilities needing large-scale modular installation (350mm flange
compatibility) and high-volume air circulation.
FAQ :
1,Q: Why is the extra-large 1220X620mm size critical for ISO 4-8
cleanrooms?
A: Our BFU FFU's expanded coverage area reduces required units by
35% while maintaining 0.45m/s ±3% airflow uniformity across the
entire cleanroom ceiling. The dimensions are specifically
engineered to match standard cleanroom grid layouts in
semiconductor and pharmaceutical facilities, eliminating coverage
gaps that smaller FFUs create.
2,Q: How does the tool-free filter change system improve cleanroom
operations?
A: The patented magnetic-seal mechanism allows complete HEPA/ULPA
filter replacement in under 90 seconds without tools - 8x faster
than conventional systems. This eliminates:
97% of particulate release during maintenance
85% of cleanroom downtime for filter changes
All need for technician recertification after maintenance
3,Q: What makes your ultra-low vibration system essential for
advanced manufacturing?
A: The active vibration cancellation system maintains <0.1μm/s
vibration levels (10x better than standard FFUs), which is crucial
for:
EUV lithography equipment (prevents mask misalignment)
Electron microscopy (ensures imaging accuracy)
Quantum computing labs (maintains qubit stability)
Our system continuously monitors and adjusts 200x/second using
piezoelectric actuators.
