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N Type , InSb Wafer , 2”, Test Grade -Semiconductor Wafer Manufacturing‎

    Buy cheap N Type , InSb Wafer , 2”, Test Grade -Semiconductor Wafer Manufacturing‎ from wholesalers
     
    Buy cheap N Type , InSb Wafer , 2”, Test Grade -Semiconductor Wafer Manufacturing‎ from wholesalers
    • Buy cheap N Type , InSb Wafer , 2”, Test Grade -Semiconductor Wafer Manufacturing‎ from wholesalers

    N Type , InSb Wafer , 2”, Test Grade -Semiconductor Wafer Manufacturing‎

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    Brand Name : PAM-XIAMEN
    Payment Terms : T/T
    Supply Ability : 10,000 wafers/month
    Delivery Time : 5-50 working days
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    N Type , InSb Wafer , 2”, Test Grade -Semiconductor Wafer Manufacturing‎

    N Type , InSb Wafer , 2”, Test Grade -Semiconductor Wafer Manufacturing‎

    PAM-XIAMEN provides single crystal InSb(Indium Antimonide) wafer growth by Liquid Encapsulated Czochralski ( LEC ) method. Indium Antimonide (InSb) can be supplied as wafers with as-cut, etched or polished finishes and are available in a wide range of carrier concentration, diameter and thickness.PAM-XIAMEN can provide epi ready grade InSb wafer for your MOCVD & MBE epitaxial application .


    Please contact our engineer team for more wafer information.

    N Type, InSb Wafer, 2”, Test Grade

    Wafer Specification
    ItemSpecifications
    Wafer Diameter

    2″50.5±0.5mm

    Crystal Orientation

    2″(111)AorB±0.1°

    Thickness

    2″625±25um

    Primary flat length

    2″16±2mm

    Secondary flat length

    2″8±1mm

    Surface FinishP/E, P/P
    PackageEpi-Ready,Single wafer container or CF cassette

    Electrical and Doping Specification
    Conduction Typen-typen-typen-typen-type
    DopantUndopedTelluriumLow telluriumHigh tellurium
    EPD cm-2≤50
    Mobility cm² V-1s-1≥4*105≥2.5*104≥2.5*105Not Specified
    Carrier Concentration cm-35*1013-3*1014(1-7)*10174*1014-2*1015≥1*1018


    Band structure and carrier concentration of InSb Wafer

    Band structure and carrier concentration of InSb Wafer include Basic Parameters,Temperature, Dependences,Dependence of the Energy Gap on Hydrostatic Pressure, Effective Masses, Donors and Acceptors

    Basic Parameters
    Temperature Dependences
    Dependence of the Energy Gap on Hydrostatic Pressure
    Effective Masses
    Donors and Acceptors

    Basic Parameters

    Energy gap0.17 eV
    Energy separation (EΓL) between Γ and L valleys0.51 eV
    Energy separation (EΓX) between Γ and X valleys0.83 eV
    Energy spin-orbital splitting0.80 eV
    Intrinsic carrier concentration2·1016 cm-3
    Intrinsic resistivity4·10-3 Ω·cm
    Effective conduction band density of states4.2·1016 cm-3
    Effective valence band density of states7.3·1018 cm-3

    Band structure and carrier concentration of InSb 300 K
    Eg = 0.17 eV
    EL = 0.68 eV
    EX= 1.0 eV
    Eso = 0.8 eV

    Temperature Dependences

    Temperature dependence of the energy gap

    Eg = 0.24 - 6·10-4·T2/(T+500) (eV),
    where T is temperatures in degrees K (0 < T < 300).

    Effective density of states in the conduction band

    Nc~ 8·1012·T3/2 (cm-3)

    Effective density of states in the valence band

    Nn ~ 1.4·1015·T3/2 (cm-3).

    Intrinsic Carrier Concentration

    ni = (Nc·Nν)1/2exp(-Eg/(2kbT))
    For 200K < T < 800 K ni = 2.9·1011(2400 - T)3/4 ·(1+2.7·10-4·T)·T3/2 ·exp(-(0.129 - 1.5·10-4T)/(2kbT)) (cm-3)

    The temperature dependences of the intrinsic carrier concentration.
    Fermi level versus temperature for different concentrations of shallow donors and acceptors.

    Dependences on Hydrostatic Pressure

    Eg≈Eg(0) + 13.7·10-3P - 3.6·10-5P2 (eV)
    EL≈EL(0) + 4.7·10-3P - 1.1·10-5P2 (eV)
    EX≈EX(0) - 3.5·10-3P + 0.64·10-5P2 (eV),
    where P is pressure in kbar.

    Effective Masses

    Electrons:
    For Γ-valleymΓ = 0.0.14mo
    Non-parabolicity:
    E(1+αE) = h2k2/(2mΓ)
    α = 4.1 (eV-1)
    In the L-valley effective mass of density of statesmL=0.25mo

    Electron effective mass versus electron concentration

    Holes:mh = 0.43mo
    Heavymh = 0.43mo
    Lightmlp = 0.015mo
    Split-off bandmso = 0.19mo
    Effective mass of density of statesmv = 0.43mo

    Donors and Acceptors

    Ionization energies of shallow donors ~0.0007 (eV):

    Se, S, Te.

    Ionization energies of shallow acceptors (eV):

    CdZnCrCu°Cu-
    0.010.010.070.0280.056

    Are You Looking for an InSb substrate?

    PAM-XIAMEN is proud to offer indium phosphide substrate for all different kinds of projects. If you are looking for InSb wafers, send us enquiry today to learn more about how we can work with you to get you the InSb wafers you need for your next project. Our group team is looking forward to providing both quality products and excellent service for you!

























    Product Tags:

    as cut wafer

      

    polished silicon wafer

      
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