Sputtering Targets
Er
Name: metal Erbium target Purity: TREM:99.5% Er/TREM:99.95%
Yb
Name: Ytterbium target Purity: TREM:99.9% Yb/TREM:99.95%
Ni
Name: High purity Ni target Purity: 3N6
Zn
Name: high purity zinc target Purity: 99.995%
Nickel Chromium Silicon Alloy
Ingredients: nickel 50 chromium 45 silicon 5wt% Production process: vacuum magnetic xuanhu furnace and HP hot pressing equipment We produce various proportions of Ni Cr, Ni Fe, Ni Mn, Ni Al, Ni Cu, Ni Ti and so on. The products are heated, forged and rolled, with uniform grain size, precision machined by numerical control and high surface finish. Packing methods: vacuum packing, wooden case delivery
Ga2O3
Ga2O3 Targets 4N Ø100×8mm ＞80% 4N Φ50.8mm；Φ76.2mm；Φ101.6mm Powder: 5N 2-5μm 50g；100g；500g；1kg Advantage 1. the content of the impurity elements is very low 2. good electrical conductivity, product density is good 3. the preparation is usually made by chemical refining, electrolysis refining, extraction refining, etc. Application: Magnetron sputtering coating material; Packaging: Vacuum packaging / vacuum neutral packing / special packaging reinforcement packaging Manufacturin
High purity aluminum Sputtering Targets
Use of aluminum particles: Surface finishing processing is widely used in aluminum casting and copper, zinc casting, metal surface polishing, sandblasting burr, burr removing casting workpiece, blade surface, casting products surface sandblast etc.. It can make your product smooth, bright, bright and whitening. At the same time, but also the use of stainless steel and aluminum powder sand, stainless steel pill mix, on the surface of the workpiece to achieve whiter brighter
Zirconium
Zr/Zirconium sputtering target Available purity: 99.5%,99.9% Dimension: As per your request Available shape: round, rectangle Density: 6.508g/cm3 Melting point: 1852℃ Boiling point: 4377℃ Available for COA( Certificate of Analysis) Grade Element composition(%)
ZrO2
Material Purity Density (g/cm3) Shape & Size Zirconium Oxide 99.9% 5.56 Circular Ф18~30x7~18mm Sector Plate
SiO2
Purity Density (g/cm3) Shape & Size 99.9% 2.21 Circular Φ18~30x7~18mm Rine Φ230~350x5~20mm Plate
MgO
Material Purity Density (g/cm3) Shape & Size Magnesium Oxide 99.9% 3.58 Circular Ф50~90x8~12mm
TiO2
Material Purity Density (g/cm3) Shape & Size Titanium Oxide 99.9% 4.24 Circular Ф50~90x8~12mm
Silicon Sputtering Targets
Content: Silicon Purity ≥99.99% Relative Density ≥96% Electrical Resistivity ≤8Ω.cm Unit Power: 30Kw/m Grain Size ≤100um Dimension: Max Length: 4000mm Max Thickness:13mm
Silicon Aluminum Sputtering Targets
Content: Silicon 90 Aluminium 10 ,or customized Purity: ≥99.95% Relative Density ≥96% Electrical Resistivity ≤10Ω.cm Unit Power: 30Kw/m Grain Size ≤100um Dimension: Max Length: 4000mm Max Thickness:13mm
Cr Sputtering Targets
Manufacturing Process: Sprayed; HIP Content: Chromium Chromium Purity: 99.5%~99.8% 99.5%~99.95% Relative Density: >95.0% >99.0% Grain Size:
Titanium Sputtering Targets
Material: Titanium Shape: Tablet(Evaporation Material); Rolling; Grinding; Wirecutting; Picking; Φ3x3; Φ6x6; Φ26x3; Gr1(2N7);Gr2(2N5);4N; 4N5;5N; 99.7-99.999% Round(Arc); Forging Turing; CNC Lathe; Φ40x17;Φ63x32;Φ62x38;Φ100x32;Φ100x40;Φ100x45;Φ152.4x42;Φ105x16;Φ160x12;Gr1(2N7);Gr2(2N5);4N; 4N5;5N; 99.7-99.999% Pipe(Rotary): Exruding turning; CNC Lathe; Φ70xΦ56x10150/2100;Φ89.4x8x1960;Φ152xΦ125x966/1566;Φ141xΦ125x1550; Gr1(2N7);Gr2(2N5);4N; 4N5;5N; 99.7-99.999% Planar: Rolling
Aluminum Target
Target name: aluminum target Common Purity: 99.9% (3N) 99.99% (4N) 99.999% (5N) 99.9999% (6N) Common dimensions: 100*40mm Maximum size: long 3000mm
Sputtering target, particles, block, silk, powder, tablets,1-3mm,2-5mm,3-6mm,1-6mm, Au,Al,Pt,Cr ,Ni,Cu,S,Mo,Ti,Se,Ge,WO3
Au gold particles 99.999% 3*4mm; Al aluminum particles 99.999% 6*6mm Pt platinum particles 99.99% 2*6mm; Cr chrome particles 99.95% 3-5mm Ni nickel particles 99.999% 6*6mm; Cu copper particles 99.99% 3*3mm S sulfur particles 99.999% 1-6mm; Mo molybdenum particles 99.95% 6*6mm Ti titanium particles 99.999% 6*5mm; Se selenium particles 99.999% 2-6mm Ge germanium particles 99.9999% 2-5mm; WO3 99.99% 1-3mm WO3 particles Mo3 1-3mm 99.99% particles of molybdenum trioxide; SiO2