Single Crystal Substrates
YIG SGGG Substrates Wafer - 3 Inch Diameter Czochralski Grown Crystal with 7.09 g/cm³ Density
High-quality SGGG substrates grown by Czochralski method, featuring 3-inch diameter maximum size, 7.5 Mohs hardness, and 1730°C melting point. Ideal for YIG, BiYIG, and GdBIG epitaxial films in microwave devices and communications applications. Available in (100) and (111) orientations with precise technical specifications.
LiNbO3 Electro-Optic Device Crystal - 420-5200nm Transparency Range, 4.64g/cm³ Density for Optical Modulation
High-quality Lithium Niobate crystals featuring wide 420-5200nm transparency range, large electro-optic coefficients, and excellent chemical stability. Ideal for electro-optic modulators and Q-switch applications with 1253°C melting point and 38 W/m/K thermal conductivity for reliable performance in demanding optical systems.
EPI Polish GGG Gd3Ga5O12 Single Crystal Substrates 4-inch Diameter with Low Optical Loss <0.1%/cm
Gallium Gadolinium Garnet (GGG) single crystal substrates optimized for magneto-optical applications. Features include low optical loss 1GW/cm². Available in 0.5mm and 1.0mm thicknesses with single or double side polishing options for superior performance in magnetic refrigeration and epitaxy growth systems.
4-inch Diameter 1mm SGGG Wafer - Substituted Gadolinium Gallium Garnet Substrate with 12.497Å Lattice Constant
Premium 4-inch diameter 1mm thick SGGG wafer for liquid epitaxy applications. Features 12.497Å lattice constant, 1730°C melting point, >99.99% purity, and superior surface polish. Ideal for magneto-optical films in optical communication equipment. SGS certified with over 20 years manufacturing expertise.
7.09g/cm³ Substituted Gadolinium Gallium Garnet GSGG Single Crystal Wafer - 1730°C Melting Point, 7.5 Mohs Hardness
High-purity Substituted Gadolinium Gallium Garnet (GSGG) single crystal wafer with 7.09g/cm³ density and 1730°C melting point. Ideal substrate for magneto-optical films in optical communication systems, featuring lattice matching for YIG/BIG epitaxial growth. Available in standard and custom sizes with double-side polish and vacuum packaging.
4-Inch Diameter 500µm GGG Gadolinium Gallium Garnet Substrates for Optical Isolators with 7.09 g/cm³ Density
Premium 4-inch diameter, 500µm thick GGG substrates for magneto-optical applications. Features 7.5 Mohs hardness, 1730°C melting point, and excellent transmission range from 0.3 to 7.0 mm. Ideal for optical communication isolators and epitaxial film growth with precise dimensional tolerances and superior surface quality.
Round LaAlO3 Wafer Optical Substrate - 3.79Å Cubic Structure, 2080°C Melting Point, Double Side Polished
High-temperature superconducting LaAlO3 wafer substrate with 6.52 g/cm³ density and 10×10⁻⁶/°C thermal expansion. Features low dielectric loss (3×10⁻⁴ @ 300K), excellent lattice matching, and superior chemical stability for electronic devices, catalysis, and thin film applications.
Co:Spinel Optical Substrate Crystal for 1.54μm Eye-Safe Lasers with 3.5×10⁻¹⁹cm² Absorption Cross Section
Co²⁺:MgAl₂O₄ crystals provide superior passive Q-switching for 1.2-1.6μm lasers, featuring high absorption cross section (3.5×10⁻¹⁹cm²), negligible excited-state absorption, and laser-grade polishing. Ideal for eye-safe 1.54μm Er:glass laser systems with damage threshold exceeding 500MW/cm².
6.74 g/cm³ Double Side Polished LSAT Optical Substrate - Cubic Crystal Structure 3.868 Å for Epitaxial Thin Films
LSAT (Lanthanum-Strontium Aluminium Tantalate) crystal substrates feature 6.74 g/cm³ density and 1840°C melting point. With excellent lattice matching for high-temperature superconductors and oxide materials, these twin-free substrates support magnetic, ferro-electronic, and superconductive device applications. Available in standard sizes with custom options.
Substituted Gadolinium Gallium Garnet SGGG Optical Substrate - 3 Inch Diameter, 7.09 g/cm³ Density for Magneto-Optical Films
High-quality SGGG optical substrate with 3-inch diameter and 7.09 g/cm³ density, designed for magneto-optical film epitaxial growth. Features excellent transmission range (0.3-7.0 μm), hardness of 7.5 Mohs, and precise dimensional tolerances for optical communication isolators and liquid epitaxy applications.
3 Inch Diameter SGGG Substrate Film - Substituted Gadolinium Gallium Garnet with 7.09 g/cm³ Density and 1730°C Melting Point
High-quality 3-inch diameter SGGG substrate film grown via Czochralski method, featuring excellent transmission range (0.3-7.0 μm), high hardness (7.5 Mohs), and precise dimensional tolerances. Ideal substrate for bismuth-substituted iron garnet epitaxial films used in YIG and BIG applications. Available with custom dopants and multiple orientation options.
EPI Polished GSGG Single Crystal 10x10x0.5mm with 7.09 g/cm³ Density for Magneto-Optical Applications
High-quality GSGG single crystal substrate grown by Czochralski method, featuring 10×10×0.5mm dimensions and 7.09 g/cm³ density. Ideal for YIG/BIG epitaxial films, microwave devices, and optical isolators. Offers excellent physical properties including 7.5 Mohs hardness, 1.95 refractive index, and superior chemical stability for demanding industrial applications.
SGGG Single Crystal Substrate 12.480 Å Cubic Structure for YIG/BiYIG/GdBIG Film Growth
High-purity SGGG single crystal substrates with 12.480 Å cubic structure, grown via Czochralski method. Features 7.09 g/cm³ density, 7.5 Mohs hardness, and excellent dielectric properties for growing bismuth-substituted iron garnet epitaxial films. Available in diameters from 2.8-76 mm with precise manufacturing tolerances.
MgAl2O4 Magnesium Aluminate Single Crystal Substrate - 2 Inch Diameter, 0.5mm Thickness, 2130℃ Melting Point
High-quality MgAl2O4 single crystal substrates with 2-inch diameter and 0.5mm thickness. Features cubic crystal structure, 8 Mohs hardness, and exceptional thermal stability with 2130℃ melting point. Ideal for sonic/microwave devices and III-V nitride epitaxial applications. Available in multiple orientations with single or double-sided polishing.
Dia 50mm Piezoelectric LGS Crystal Single Material Custom Angle Direction for SAW Filters
High-performance LGS crystal with 3x quartz electromechanical coupling. Grown by Czochralski method, max dia 60mm. Custom sizes and cutting angles available. Ideal for SAW/BAW devices, sensors, and Q-switches. Stable thermal and chemical properties.
Co2+:MgAl2O4 Single Crystal Substrate for 1.54μm Eye-Safe Lasers with 3.5×10⁻¹⁹cm² Absorption and >500MW/cm² Damage Threshold
Advanced Co2+:MgAl2O4 single crystal substrate optimized for passive Q-switching in 1.2-1.6μm laser systems. Features high absorption cross section (3.5×10⁻¹⁹cm²), negligible excited-state absorption, and compatibility with flash-lamp and diode-laser pumping. Delivers exceptional optical quality with laser-grade polishing and specialized coatings for reliable performance in eye-safe laser applications.
Substituted GGG Gallium Gadolinium Garnet Wafer 12.497A Lattice Constant 76mm Diameter
High lattice constant 12.497A substituted GGG wafer for YIG/BIG film epitaxy. Features low optical loss 1GW/cm2. Custom orientations and sizes available.
111 Orientation Gallium Gadolinium Garnet Single Crystal Substrates 4 inch Diameter
Czochralski-grown GGG substrates with orientation, ±15 arc min tolerance. Diameter up to 4 inch, roughness
Custom Gd3Ga5O12 Single Crystalline Substrates 4 inch Diameter for Microwave Devices
Crysto's GGG substrates offer low optical loss (1GW/cm2). Available up to 4 inch diameter, custom orientation, polishing, and edge cutting. Ideal for microwave and optical isolator applications.
SGGG EPI 1SP Single Crystal Substrates - 3 Inch Diameter, 12.505 Å Lattice Constant for Magneto-Optical Films
Premium SGGG single crystal substrates grown by Czochralski method with 12.505 Å lattice constant and 7.09 g/cm³ density. Ideal for YIG and BIG magneto-optical film epitaxy with superior surface polish and transmission range of 0.3-7.0 mm. Perfect for advanced optical and electronic applications requiring high-quality epitaxial growth surfaces.