China Mo Metal Sputtering Target Molybdenum Sputtering Target for sale
China Mo Metal Sputtering Target Molybdenum Sputtering Target for sale
China Mo Metal Sputtering Target Molybdenum Sputtering Target for sale

Mo Metal Sputtering Target Molybdenum Sputtering Target

Molybdenum targets, a rising star in high-performance materials With the continuous advancement of material science, molybdenum targets have emerged as a key driver in various fields. Molybdenum targets are critical across the semiconductor, display, photovoltaic, and high-end manufacturing sectors, delivering unique performance advantages that drive industrial innovation. Excellent Properties of Molybdenum Targets l Ultra-high Purity Molybdenum targets typically have a high

Place of Origin china
Resistivity It is 5.17 × 10⁻¹⁰ Ω·cm at 0℃; 24.6 × 10⁻¹⁰ Ω·cm at 800℃; and 72 × 10⁻¹⁰ Ω·cm at 2400℃
Application Fields Semiconductor Industry, Display Panels, Photovoltaic Industry, Low-emissivity Glass
Packaging Details Vacuum-sealed packaging, case-packed for storage and transport
Product Specifications Flat target, Rotating target
Purity 99.95%-99.999%
Product Description

Molybdenum targets, a rising star in high-performance materials

With the continuous advancement of material science, molybdenum targets have emerged as a key driver in various fields. Molybdenum targets are critical across the semiconductor, display, photovoltaic, and high-end manufacturing sectors, delivering unique performance advantages that drive industrial innovation.

Excellent Properties of Molybdenum Targets

 

l Ultra-high Purity

 

Molybdenum targets typically have a high purity of ≥99.95%, with some reaching 5N (99.999%). Extremely low impurity content, such as Fe and Ni <50ppm, and O <200ppm, ensures stable electrical performance of sputtered films, laying a solid foundation for high-precision applications like semiconductor chip manufacturing.

 

 

l High-temperature Oxidation Resistance

 

With an ultra-high melting point of 2623℃, weight gain from oxidation in air at 1000℃ is <0.1mg/cm² (100 hours). For example, a photovoltaic company using Mo targets to prepare TCO films showed no failure after 500 hours under 85℃/85% RH testing, demonstrating outstanding stability in high-temperature and harsh environments.

 

 

l Precise Structure and Excellent Conductivity

 

Density: 10.28 g/cm³ (99% theoretical), grain size <50μm, flatness ≤0.05mm (Φ100mm target). Excellent conductivity of high-purity Mo (resistivity 5.2 μΩ·cm) ensures efficient current transfer during sputtering, improving sputtering efficiency. The precise structural design is compatible with high-precision sputtering equipment, ensuring coating accuracy and uniformity.

 

 Applications of Molybdenum Targets

 

l Semiconductor Industry

 

Molybdenum targets are used in the semiconductor industry to prepare bottom electrodes for metal silicon wafers, providing stable current and ensuring wafer quality.

 

 

l Display Panels

 

Molybdenum target material is used in liquid crystal displays (LCDs) to enhance brightness, contrast, color, and lifespan.

 

 

l Photovoltaic Industry

 

Molybdenum targets are used in solar cell manufacturing as electrode materials, improving conversion efficiency.

 

 

l Low-emissivity Glass

 

Molybdenum targets are used in the production of STN/TN/TFT-LCDs and low-emissivity glass, suitable for various coating systems.

 

 

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