High Purity Graphite Sputtering Target Hot Pressing Sintering Process

Engineered from high-purity graphite, the graphite targets exhibit exceptional thermal stability, superior heat resistance, and a low coefficient of thermal expansion. These targets are critical for depositing high-performance carbon films in sectors such as semiconductors, photovoltaics, and advanced battery materials, where maintaining material integrity during high-temperature processing is paramount.

Outstanding Features of Graphite Target

l High Thermal Stability

It maintains stable performance in high-power, high-temperature sputtering processes, ensuring uniform film deposition.

l Low Thermal Expansion Coefficient

It is dimensionally stable under temperature changes, reducing deposition stress and enhancing the film's density and adhesion.

l Excellent Electrical Conductivity

Graphite targets have good electrical conductivity, making them suitable for the preparation of electronic devices, functional films, and conductive layers.

Wide Applications of Graphite Target

l Semiconductor Manufacturing

Graphite targets are used for preparing conductive films, carbon barrier layers, and interconnect layers, ensuring high performance and stability of devices.

l Optical Component Manufacturing

Used for preparing carbon films, anti-reflection coatings, and infrared absorption films, widely applied in optical components, laser devices, and infrared windows.

l Photovoltaic Industry

Used in photovoltaic cell back electrodes, fuel cell carbon layers, and supercapacitor conductive layers, enhancing energy conversion efficiency and device lifespan.

l Aerospace

Films deposited by graphite targets can serve as high-temperature protective coatings, improving heat resistance and wear resistance.