Pulsed Laser Deposition System

Main parameter index: 1.: the ultimate vacuum coating chamber is ≤6.6X10-5Pa; the pumping time: 30 minutes is better than 8X10-4Pa 2. target: 4 feet rotation target (with shield), revolution, rotation and scanning, target substrate distance adjustable (30-90mm) 3. substrate rotation: revolution, rotation of two samples of toga shield 4. substrate heating temperature: the use of armored heating plate,0-800℃ continuous adjustable; using temperature control instrument for