Tungsten Target
High Purity 99.97% Tungsten Sputtering Target 19.25 g/cm3 Density for PVD Coating
High purity 99.97% tungsten sputtering target with density 18.8-19 g/cm3, fine grain structure, and high wear resistance. Meets ASTM B 760-2007 and GB 3875-2006 standards. Custom sizes available for semiconductor, CVD, and PVD applications.
Tungsten Sputtering Target 99.95% Purity 100mm Length High Wear Resistance Thermal Conductivity
High purity 99.95% tungsten sputtering target with 100mm length. Features high density, wear resistance, thermal conductivity, and corrosion resistance. Ideal for semiconductor, CVD, and PVD applications. Custom sizes available.
99.95% Pure Tungsten Target for PVD Coating Custom Size 140-300mm OD
High-purity tungsten target (99.95% min) for PVD and CVD applications. Features high melting point, low vapor pressure, and excellent thermal conductivity. Custom sizes available with mirror polishing. Ideal for semiconductor and display coating.
99.95% Pure Tungsten Sputtering Target 19.25 g/cm3 for Aerospace and Rare Earth Smelting
High-purity 99.95% W tungsten sputtering target with 19.25 g/cm3 density. Features smooth surface, high ductility, and homogeneous microstructure. Custom sizes available. Ideal for aerospace, rare earth smelting, CVD, and PVD applications.