Semiconductor Grade 3000℃ Maximum Temperature Graphitization Furnace with High-Efficiency Filtration System
JTG-SC3000 semiconductor-grade carbon nanotube purification furnace combines high-temperature graphitization with chemical purification methods. Engineered for new energy vehicles, semiconductor, and
Semiconductor Carbon Nanotube Purification High Temperature Vacuum Graphitization Furnace with Chemical Treatment
JTG-SC3000 semiconductor-grade carbon nanotube purification furnace combines high-temperature graphitization with chemical purification methods. Engineered for new energy vehicles, semiconductor, and advanced materials industries requiring ultra-high purity carbon nanotube materials.
Key Features
- Combined high-temperature and chemical purification method for maximum purity
- 3000℃ working temperature for complete carbon nanotube graphitization
- High-efficiency filtration system for contaminant removal during processing
- ±5℃ temperature uniformity across the entire processing chamber
- SS 304 construction with corrosion-resistant internal coating
Applications
Designed for semiconductor industry carbon nanotube purification, new energy vehicle battery materials, and advanced electronic component manufacturing.
Technical Advantages
- Dual purification method achieves purity levels exceeding industry standards
- High-efficiency filtration captures metallic contaminants during processing
- Temperature uniformity ensures consistent CNT quality across large batches
- Corrosion-resistant design for long service life in chemical processing environments
After-Sales Service
1 year comprehensive warranty with remote technical support. On-site installation and training available. Spare parts supplied within 7 working days. Lifetime technical consultation included.
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