Semiconductor Oven SEO Series

Semiconductor Oven SEO Series Product Overview The Semiconductor Oven SEO Series features high capacity PID adjustment with excellent air tightness for nitrogen-filled environments. Designed for semiconductor wafer curing, IC packages, and glass substrates, this oven delivers superior temperature uniformity and stability. Key Specifications Attribute Value Model SEO-100N Dimension 1700(L)*1200(W)*1800(H)mm Weight 500-800kg Total Power 21KW Temperature Accuracy ±0.5℃

Temperature control mode PID closed-loop control+SSR drive
Place of Origin Shenzhen, Guangdong Province, China
Customizable Yes
Packaging Details Plywood crate
Dimension 1700(L)*1200(W)*1800(H)mm
Model Number SEO-100N
Product Description
Semiconductor Oven SEO Series
Product Overview

The Semiconductor Oven SEO Series features high capacity PID adjustment with excellent air tightness for nitrogen-filled environments. Designed for semiconductor wafer curing, IC packages, and glass substrates, this oven delivers superior temperature uniformity and stability.

Key Specifications
Attribute Value
Model SEO-100N
Dimension 1700(L)*1200(W)*1800(H)mm
Weight 500-800kg
Total Power 21KW
Temperature Accuracy ±0.5℃
Temperature Range Room temperature+10℃~250℃
Core Technology
  • Horizontal Air Recirculation: High capacity system ensures superior temperature uniformity
  • Fully Sealed Chamber: Stainless steel construction with excellent air tightness for nitrogen efficiency
  • High Temperature Motor: Long-axis motor with large turbine blades for stable high-temperature operation
  • Precision Control: PID adjustment with 0.5℃ accuracy and programmable process profiles
  • Cleanroom Compatibility: Meets thousand-grade cleanroom standards for semiconductor production
  • Oxygen Control: Dual channel analysis maintains oxygen content below 50PPM
System Features
Chamber Structure

Features upper and lower hot air circulation systems with adjustable airflow. Constructed with high-quality stainless steel and layered brackets for optimal space utilization.

Nitrogen System

Equipped with multiple flow meters and oxygen analyzers for real-time monitoring. Maintains oxygen content below 500PPM (option for 100PPM).

Cooling System

Water cooling with fin radiator blast technology reduces cooling time while preventing product damage from rapid temperature changes.

Safety Protection

Includes over-temperature protection, oxygen content monitoring, nitrogen pressure alarms, electronic safety locks, and emergency stop switch.

Performance Validation

Particle concentration ≤35,200 (0.5μm) meets thousand-class cleanroom standards.

Semiconductor oven clarity test results showing particle concentration measurements

High precision temperature control with PID regulation ensures uniform heat distribution.

Temperature profile test results demonstrating oven's uniform heat distribution
Technical Parameters
Parameter Specification
Box Dimension 700(L)*550(W)*(600*2)(H)mm
Working Mode Two independent boxes (1-4 optional)
Temperature Uniformity ±1.5%℃ (no-load)
Heating Time ≤15min (200℃ no-load)
Cooling Rate 2-5℃/min
Cleanliness Class Class 1000
Installation Requirements

Gas Source: Nitrogen purity 99.999% at 0.5-0.8Mpa

Power: 380V 50/60HZ three phase five wire with 25mm² cable

Environment: 5-40℃ temperature range, 20-95% relative humidity

Floor Load: Minimum 1000kg/m²

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Price: Negotiable
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