CMP Polishing Ceramic Block Semiconductor Consumables ISO9001
Ceramic block is made of high purity and ultra-fine alumina powder by high temperature curing. Main features High purity, less impurities, high hardness,wear resistance and corrosion resistance. High precision, small thermal expansion coefficient and good accuracy retention, good wear resistance and corrosion resistance. Application It is mainly used for thinning, hard polishing and CMP polishing of LED substrate and semiconductor wafers(sapphire wafer, SiC wafer,silicon
Ceramic block is made of high purity and ultra-fine alumina powder by high temperature curing.
Main features
High purity, less impurities, high hardness,wear resistance and corrosion resistance.
High precision, small thermal expansion coefficient and good accuracy retention, good wear resistance and corrosion resistance.
Application
It is mainly used for thinning, hard polishing and CMP polishing of LED substrate and semiconductor wafers(sapphire wafer, SiC wafer,silicon wafer, germanium wafer, GaAs wafer, GaN wafer, etc.).
Specification
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