10.2g/Cm3 Pure Molybdenum Rectangular/Round Plate Sputtering Target For Coating

10.2g/cm3 Pure Molybdenum Sputtering Target For Coating

Introduction of Molybdenum Sputtering Target

The molybdenum sputtering target has the characteristics of high purity, high density and fine grain, so that the sputtering efficiency, uniform film thickness and smooth etching surface are obtained in sputtering.

There are two kinds of molybdenum sputtering targets:molybdenum planar target and molybdenum rotary target.

Molybdenum target is one kind of industrial material, which is widely used in conductive glass, STN / TN / TFT-LCD, optical glass, ion coating and other industries. It is suitable for all planar coating and rotary coating systems.

Applications of Molybdenum Sputtering Target:

Molybdenum sputtering target can be applied in vacuum coating industry, ion sputtering, flat panel display industry and photovoltaic industry. Molybdenum sputtering target can be used as thin-film solar cell electrode, wiring material and barrier layer material of semiconductor.

Therefore, molybdenum has become one of the preferred sputtering targets for flat panel displays. It is very important that, according to experts, molybdenum can also greatly improve the brightness, contrast, color and other performance of LCD and extend its service life.

For TFT-LCD molybdenum target, we can offer vacuum welding for large-size molybdenum target with copper base plate. 

Characteristics and specifications of molybdenum target:

Molybdenum sputtering target has excellent characteristics of molybdenum, such as high melting point, high electrical conductivity, shiny surface, better corrosion resistance and outstanding environmental protection.

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