PVD Titanium Alloy Sputtering Target 99.95% Purity 400mm Diameter for Semiconductor Coatings

PVD Titanium Alloy Sputtering Target Description

PVD coating technology physically converts a material from a solid state to a gaseous state, which is then deposited on a target substrate to form a thin film. The properties of the target material directly affect the quality, performance and cost-effectiveness of the film. PVD Titanium Alloy Sputtering Target PVD Titanium alloy sputtering Target is made of high quality titanium alloy materials (such as titanium aluminum, chromium or nickel) made by vacuum smelting or hot isostatic pressing. It can provide high purity, chemical stability, and excellent mechanical properties of conductive or reflective films. PVD Titanium Alloy Sputtering Target has high specific strength, excellent corrosion resistance and oxidation resistance, high temperature resistance, wear resistance, good biocompatibility, high coating quality and excellent characteristics. It is widely used in semiconductor devices, hard coatings and anti-corrosion coatings (improve tool hardness and service life), decorative coatings (surface treatment of various colors and luster).

PVD Titanium Alloy Sputtering Target Specifications:

PVD Titanium Alloy Sputtering Target Picture