China Newest Effective Technology with 3 Systems , E-light Laser Machine , RF/IPL/E-light for sale
China Newest Effective Technology with 3 Systems , E-light Laser Machine , RF/IPL/E-light for sale

Newest Effective Technology with 3 Systems , E-light Laser Machine , RF/IPL/E-light

Newest Effective Technology with 3 Systems , E-light Laser Machine , RF/IPL/E-light Technical Parameter Light Source Intense Pulsed Light Wave Length 560-1200 nm,690-1200 nm Light guide Crystal light guide Control Mode Touch Control Safety Classification Class I, Type B Energy density 10-60J/cm2 (Deviation≤±2%) Pulse duration/width 16-150ms Frequency ≤1P/3S RF input power 150w RF energy density 0-50w Spot size 8×34mm(SR/VR) 16×57mm (HR) ( Deviation ≤0.2mm) Spot Surface

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